Product news
Two-photon lithography system
Feb 26, 2024
Our Photonic Professional GT2 two-photon lithography system from Nanoscribe enables nano- to meso to macro additive manufacturing of polymers based on the principles of two-photon absorption. It can be used to create crystal lattice-like, porous or bionic structures, undercuts, smooth contours and sharp edges out of various polymers. The flexibility, versatility and speed this system offers, facilitates rapid prototyping of concepts on substrates ranging from wafers to MEMS.
Visit us in hall 1 at the Fraunhofer IPMS booth 317.
Applications:
* Optical surfaces and structures
* Microfluidics
* Photonic & mechanical metamaterials
* Master molds for NIL
